Fabrication Micro- and Nanopatterning
Micro- and Nanopatterning
Micro- and nanolithography is a key technology in manufacturing of integrated circuits and microchips that allows for creating patterns with a feature size from nanometer up to millimeter scale. Lithography techniques can be divided into two types: masked lithography and maskless lithography. Masked lithography such as photolithography and nanoimprint lithography makes use of masks to transfer patterns over a large area simultaneously making the process cost-effective. Maskless lithography such as electron beam lithography and laser writing enable arbitrary patterns with high-resolution and a minimum feature size as small as a few nanometers.
Fabrication Micro- and Nanopatterning
Nanoimprint Lithography, NIL
We offer master element fabrication and nanoimprint lithography services. We can produce anything from single prototypes to small-scale mass production runs of tens to hundreds of components, all levels of precision and repeatability.
Fabrication Micro- and Nanopatterning
Spin coating
Spin coating is a simple and widely used technique for depositing thin films from liquid solutions. A small amount of the coating material is dispensed onto a substrate, which is then spun at high speed to spread the liquid evenly.…
Fabrication Micro- and Nanopatterning
Digital holographic microscopy and interference lithography
Digital holographic microscopy (DHM) is a quantitative phase imaging technique, where both the amplitude and phase of light interacting with a sample are measured. The phase contains information on the height and refractive index variations on a sample. In the…
Fabrication Micro- and Nanopatterning
Direct writing lithography system
Heidelberg Instruments µPG-501 is a DLP-LED based maskless lithography system which can be used for three applications: Fabrication of photomasks, Maskless UV-lithography directly to wafers, and Grey-scale lithography.
Fabrication Micro- and Nanopatterning
Langmuir-Blodgett film deposition system with Brewster angle microscope
The surface pressure area isotherms and Brewster angle microscope (BAM) images are measured simultaneously.
Fabrication Micro- and Nanopatterning
Optical lithography
We offer advanced optical lithography services, including mask-based lithography for high-resolution patterning, as well as maskless methods such as DLP/LCD-based UV exposure and two-photon absorption direct writing, which are ideal for creating precise 2D and 3D micro- and nanostructures.
Fabrication Micro- and Nanopatterning
Reactive plasma etcher with chlorine chemistry (ICP-RIE)
ICP Plasmalab 100 (Oxford Plasma Technology) is a ICP-RIE system (Inductively Coupled Plasma – Reactive-Ion Etching) used mainly for semiconductor dry etches using various soft and hard masks. There is also a separate RIE unit, but the advantage of ICP…
Fabrication Micro- and Nanopatterning
Reactive plasma etcher with fluorine chemistry (RIE)
RIE Plasmalab 100 (Oxford Plasma Technology) is a RIE system (Reactive-Ion Etching) mainly used for dielectric and polymer dry etching using various soft and hard masks. There is also a separate (ICP-RIE) unit for processes where improved control of the…
Fabrication Micro- and Nanopatterning
Reactive plasma etcher with fluorine chemistry (RIE)
Advanced Vacuum Vision 320 RIE is a reactive ion etching device. Typical use cases are dry etching of thin films like SiN and SiO2 or oxygen plasma treatments to clean the substrates or to change the surface properties like hydrophilicity…
Fabrication Micro- and Nanopatterning