Thin film deposition enables the development of advanced technologies by precisely depositing thin layers of materials onto solid surfaces through different techniques. Atomic Layer Deposition (ALD) operates through a sequential, self-limiting reaction mechanism that allows for the controlled growth of thin films with atomic-level accuracy, resulting in conformal and uniform coatings with exceptional control over film composition and thickness. Molecular Beam Epitaxy (MBE) is crystalline thin film deposition method used for the fabrication of semiconductor devices that operates under ultra-high vacuum conditions and involves the evaporation of elemental or molecular species from separate sources allowing for growing atomic layers with well-defined interfaces.
We host five molecular beam epitaxy (MBE) systems equipped for the growth of all common GaAs, InP, and GaSb-based materials as well as more exotic III-V compounds.
IBS NAVIGATOR 700 (Cutting Edge Coatings GmbH, 2016) is an optical coater designed for automatic coating of planar glass substrates. The system utilizes broadband optical monitoring (BBM) through monitor fused silica windows or layers can be deposited using time control.
