Fabrication Micro- and Nanopatterning
Fabrication
Our capabilities cover a wide range of materials including carbon-based materials, semiconductors, photovoltaic materials, coatings, thin-films, and glasses. We also have a wide range of fabrication methods including epitaxy, lithography, atomic layer deposition, and 3D printing optics.
Fabrication Micro- and Nanopatterning
Nanoimprint Lithography, NIL
We offer master element fabrication and nanoimprint lithography services. We can produce anything from single prototypes to small-scale mass production runs of tens to hundreds of components, all levels of precision and repeatability.
Fabrication Micro- and Nanopatterning
Spin coating
Spin coating is a simple and widely used technique for depositing thin films from liquid solutions. A small amount of the coating material is dispensed onto a substrate, which is then spun at high speed to spread the liquid evenly.…
Fabrication Thin film deposition and epitaxy
Atomic layer deposition
Picosun Sunale ALD R200 Advanced reactor for deposition of thin films
Fabrication Micro- and Nanopatterning
Digital holographic microscopy and interference lithography
Digital holographic microscopy (DHM) is a quantitative phase imaging technique, where both the amplitude and phase of light interacting with a sample are measured. The phase contains information on the height and refractive index variations on a sample. In the…
Fabrication Micro- and Nanopatterning
Direct writing lithography system
Heidelberg Instruments µPG-501 is a DLP-LED based maskless lithography system which can be used for three applications: Fabrication of photomasks, Maskless UV-lithography directly to wafers, and Grey-scale lithography.
Fabrication Thin film deposition and epitaxy
Electron beam lithography (EBL)
We provide a high-precision electron beam patterning service for creating nanoscale structures with exceptional accuracy and flexibility — ideal for advanced research and photonic component fabrication.
Fabrication Etching
Etching
We offer precision etching of dielectrics, metals and semiconductors using Reactive Ion Etching (RIE) and Inductively Coupled Plasma RIE (ICP-RIE) equipment producing high-quality micro- and nanostructures.
Fabrication Micro- and Nanopatterning
Langmuir-Blodgett film deposition system with Brewster angle microscope
The surface pressure area isotherms and Brewster angle microscope (BAM) images are measured simultaneously.
Fabrication Material processing
Micro-manipulating system
This home-made manipulating system is for local laser excitation, object transferring and positioning at the microscopic scale.Miscellaneous fabrication related tools
These tools support the processes of sample preparation and microfabrication, including wafer dicing, substrate thinning and polishing, and plasma-based surface treatment to improve the performance of photonic component fabrication.
Fabrication Thin film deposition and epitaxy
Molecular beam epitaxy
We host five molecular beam epitaxy (MBE) systems equipped for the growth of all common GaAs, InP, and GaSb-based materials as well as more exotic III-V compounds.
Fabrication Micro- and Nanopatterning