Characterization Material and thin film characterization
Material and thin film characterization
Our comprehensive characterization techniques allows for in-depth analysis and understanding of the properties, structures, and behaviors of various materials and thin films. We have various advanced methods available to analyze the composition, crystallinity, chemical bonding, and optical properties of materials and thin films such as spectroscopy, ellipsometry, X-ray diffraction, and surface analysis.
Characterization Material and thin film characterization
Spectroscopic material characterization
The service includes various techniques to characterize material properties.
Characterization Material and thin film characterization
Characterization of epitaxial materials
We host multiple research instruments and methods for characterization of epitaxial material properties.
Characterization Material and thin film characterization
Electron spectroscopy
The Multilab/Argus Electron Spectrometer includes instruments for Selected-area and Imaging X-ray Photoelectron Spectroscopy (SAXPS/iXPS). The UHV system is modular including also preparation chambers equipped with various in situ sample preparation and fabrication facilities.
Characterization Material and thin film characterization
Inverted microscope with imaging spectrophotometer
Zeiss Axio Observer inverted microscope, 0x 0.45NA objective.
Characterization Material and thin film characterization