Rapid thermal annealing of semiconductor wafers (RTA / RTP)

Jipelec Jetfirst100 is a rapid thermal annealing (RTA) system that can be used for thermal processing such as increasing/decreasing defects in crystalline materials, inducing phase changes etc.

The system utilizes halogen lamps for sample heating and both thermocouple and pyrometer for temperature monitoring. System is equipped with vacuum pump that can evacuate the system in rough vacuum and N₂ inlets for process gas and purging. Main purpose of the system is short thermal processing of a variety of different kind of samples. Sample carriers are 4-inch sized wafers.

Carriers: Si, graphite coated SiC box

Process atmospheres: N₂, air, vacuum

Temperature range: Room temperature – 1000 °C

For a user to get training for RTA, they have to have:

• Frequent need           (systems should be used regularly in order to maintain the level of competence of the operators)
• A suitable process in mind                 (to get a training you should have at least a preliminary process in mind that is suitable for your samples)

Just to name a few unallowed processes and reasons why they are not usable. Any non-standard process needs approval from the responsible person for the same reasons than listed below.

• No long (> 20 min hold) processes: the system is built for rapid thermal annealing, so extended heat exposure might damage the system.
• Samples that don’t endure the heat: Anything that can melt or vaporize in the set temperatures should be avoided due to health and contamination hazards.