Heidelberg Instruments µPG-501 is a DLP-LED based maskless lithography system which can be used for three applications: Fabrication of photomasks, Maskless UV-lithography directly to wafers, and Grey-scale lithography.
Details
Location:
Tampere University (TAU), Tampere
Contact person:
Jukka Viheriälä (Tampere)
Info:
Heidelberg Instruments µPG-501 is a DLP-LED based maskless lithography system which can be used for three applications: Fabrication of photomasks, Maskless UV-lithography directly to wafers, and Grey-scale lithography.
Specifications
Exposure wavelength: 375 nm
Minimum linewidth: ~1.5-2 µm
Max substrate size: 6″x6″
Max exposure area: 5″x5″
Write speed: 100 mm2/minute
Substrates: Mask blanks, silicon and glass wafers etc.
Supported file formats: cif, dxf, gdsii, gerber, bmt, stl
Training Requirements
Basic training available for those who expect to have frequent need for the system and have basic understanding of photolithography and CAD tools. For one-time mask fabrication needs processing service is available by experienced users. For more advanced features and reaching the linewidth limits as well as CAD design, capability and willingness to self-learning and experimenting is necessary.
Not allowed processes
Very small wafer fragments. Substrates containing varying heights.
Send an enquiry
"*" indicates required fields