The desktop laser lithography is for creating 3D microscopic features in photoresin materials, without the use of photomasks.
Details
The desktop laser lithography is for creating 3D microscopic features in photoresin materials, without the use of photomasks. The lithograph consists of imaging and autofocus systems, galvo-based system for high-speed scanning, 2D translation stage for large area fabrication. The system enables the fabrication of structures from various materials without any limitation on the type of substrate. It was purchased with funding from the European Research Council (ERC).
Technical details:
1. Femtosecond fiber laser <90 fs pulse length, 80 MHz, repetition rate, 250 mW average power, 780 nm center wavelength.
2. Long range piezo stage travel range of 120 x 100 mm² and piezo Z-stage travel range 49 mm.
3. Resolution: minimal horizontal feature size <200 nm, minimal vertical feature size <700 nm. 4. Writing speed > 500 mm/s.
5. Materials options: home-made liquid crystal elastomers, UpPhoto, UpBrix, etc.
More details, see https://www.upnano.at/nanoone/.
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