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Characterization Material and thin film characterization

Characterization of epitaxial materials

We host multiple research instruments and methods for characterization of epitaxial material properties.


Location: Tampere University (TAU), Tampere
Contact person: Antti Tukiainen (Tampere)
  • Panalytical X’Pert3 MRD x-ray diffractometer
  • Philips X’Pert Pro MRD x-ray diffractometer
  • Nikon L200 optical microscope
  • Accent RPM2000 photoluminescence and reflectance mapping tool
  • Bio Rad HL5200 Hall measurement system
  • Optical table-based low temperature micro-photoluminescense measurement setup equipped with Cryomech PT403 cryocooler, Andor spectrometers and at time resolved (TCSPC) photoluminescence measurement system
  • Optical table-based low-temperature photoluminescence measurement setup: equipped with various laser light sources (405 nm, 532 nm, 680 nm, and 980 nm), CCS-150 cryostat with CTI 8200 helium compressor, DK480 monochromator with three gratings, optical chopper, SRS830 lock-in amplifier and suitable detectors for wavelengths ranging from 350 nm to >3000 nm
  • Optical table-based photoluminescence measurement setup for photonic glasses: possibility for static luminescence measurements and time resolved studies (PicoScope 5000 series usb oscilloscope)
  • Instrument systems Spectro320 scanning spectrometer
  • Bio Rad DL8000 deep level transient Fourier spectroscopy measurement system
  • Oxford Instruments Nanoscience 7 Tesla SpectromagPT optically accessible magnetocryostat
  • Bio Rad electrochemical capacitance voltage measurement system
  • Spectrometer based surface and edge photoluminescence characterization system (520 nm excitation)
  • Boonton 7200 capacitance meter
  • Agilent E4980A 20 Hz – 2 MHz LCR meter
  • Dark spot mapping tool

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