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Characterization Electron spectroscopy for surface analysis

X-ray photoelectron spectroscopy (XPS)

The Scienta Omicron Argus Electron Spectrometer includes instruments for Selected-area and Imaging X-ray Photoelectron Spectroscopy (SAXPS/iXPS). The UHV system is modular including also preparation chambers equipped with in-situ sample preparation and fabrication facilities.


Location: Tampere University (TAU), Tampere
Contact person: Kimmo Lahtonen (Tampere)

XPS is a surface sensitive method with the sampling depth up to about 10 nm. The studied phenomena can be e.g. oxidation, reduction, aging processes, segregation, precipitation, alloying, catalysis, and surface reactions.

The analysis techniques are suitable to detect small differences between samples, enabling to connect the surface properties to the functionality of the surfaces.

The analysis can help e.g. in developing material synthesis processes, thin film deposition, and band-gap engineering.

The surface analysis can be combined with various in-situ and ex-situ sample fabrication, preparation, and surface modification facilities.

The surface sensitive analysis can be combined with other methods such as scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDS), and X-ray diffraction (XRD). In many cases XPS gives different results than EDS because the composition of a material surface and bulk may differ. XPS is more sensitive to analyse chamical bonding than EDS. It depends on the research case which method is the most suitable.

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